The PR 300 is a gas plasma device that is used widely for such applications as production of semiconductors and analysis work. It boasts outstanding operability and safety, with an automatic tuning system as a standard component and other features. It has a compact design, with a small-size RF generator and an oscillation section integrated with a portion of the chamber, allowing it to be installed into a 19-inch rack.

Three 64mm diameter chambers are included. The unit boasts extremely high per area output (Approx. 0.17W/cm2), and can be set for a wide range of output conditions to handle a variety of testing samples.

Reaction Chamber Operation Flowchart Piping System Diagram Specifications Model PR300 Method Barred type of direct plasma Control part  High frequency output 300W variable (100W × 3 chambers) Oscillating frequency 13.56 MHz Output impedance 50 ohm Tuning method Manual biaxial tuning method Instrument Output watt meter (0 to 300W) Reflected wave watt meter (0 to 100W) Vacuum gauge, bourdon's tube type Flow meter, needle valve integrated type, 1 complet set Timer 0.1sec. to 999h Gas inlet 1/4" stainless steel Power source (50/60Hz) AC 100/230V, single phase, 1 kVA Reaction part  Reaction chamber Made of super hard glass, ￠64 × 160mm × 3 rooms Electrode structure Condenser type, 2-way split Control system Auto pressure reduction, auto leak valve Piping material SUS, Teflon, copper External dimensions (W × D × Hmm) 438 × 520 × 556 Weight Approx. 38kg Standard Accessories  Vacuum grease 1 container Lid for reaction chamber 4 sets O-ring for reaction chamber 6 pcs. Adapter for ground 1 pc. Sample dish (large and small) each 4sets     Optional Accessories Sample dish (large)Sample dish (small) Sample shelf Stand